{"id":6558,"date":"2017-10-31T11:18:00","date_gmt":"2017-10-31T02:18:00","guid":{"rendered":"https:\/\/www.jpu.or.jp\/eng\/?page_id=6558"},"modified":"2017-10-31T11:18:00","modified_gmt":"2017-10-31T02:18:00","slug":"uv-exposure-index","status":"publish","type":"page","link":"https:\/\/www.jpu.or.jp\/eng\/uv-exposure-index\/","title":{"rendered":"UV Exposure Systems"},"content":{"rendered":"\n\n\n\n\n\n\n\n
Appearance<\/strong><\/td>\nProducts Name<\/strong><\/td>\nMaker<\/strong><\/td>\n<\/tr>\n
\"\"<\/a><\/td>\n\n

UV spot curing system \uff1aHYPERCURE-200<\/strong><\/a><\/p>\n

HC-200 is an ideal UV spot curing system to cure UV Curing adhesive or UV curing ink.
\n The lamp HC-200 uses is a high power Mercury-Xenon Lamp, and we cut Infrared wavelength to avoid building up heat of target under curing.\u00a0<\/p>\n<\/td>\n

\u00a0Yamashita Denso Corporation<\/td>\n<\/tr>\n
\"\"<\/a><\/td>\n\n

Mask Aligner UV Exposure system\u00a0 \uff1aUFM-50110R<\/strong><\/a><\/p>\n

UFM-50110R deep UV Exposure system uses 250nm with a effective exposure area of 110mm diameter with excellent uniformity.\u00a0 Optics is integrated with UV Dichroic mirror to cut IR radiation.\u00a0<\/p>\n<\/td>\n

\u00a0Yamashita Denso Corporation<\/td>\n<\/tr>\n
\"\"<\/a><\/td>\n\n

UV Exposure Light sources \uff1aUFM series<\/strong><\/a><\/p>\n

UFM series offers\u00a0 a customer to chose a main UV wavelength by picking up a desired mirror and also user can change the mirror to pick up a different wavelength. Exposure area of UFM series has\u00a0 excellent uniformity.<\/p>\n<\/td>\n

\u00a0Yamashita Denso Corporation<\/td>\n<\/tr>\n
\"\"<\/a><\/td>\n\n

UV Exposure system”Uniform UV Light”\uff1aUFM-200<\/strong><\/a><\/p>\n

It contains 200W Mercury-Xenon Lamp and provides 50mmx50mm exposure area with excellent uniformity. Non-uniformity at the exposure plane is better than +\/-5% and parallelism is smaller than +\/- 3 deg.<\/p>\n<\/td>\n

\u00a0Yamashita Denso Corporation<\/td>\n<\/tr>\n
\"\"<\/a><\/td>\n\n

Polarized UV beam exposure system \uff1aHC-1001PUFM<\/strong><\/a><\/p>\n

Polarized UV exposure system uses Mercury Xenon lamp and a combination of UV dichroic mirror(cold mirror) and an optical integrator realizes a UV exposure with a polarized beam.
\n \u00a0Extinction ratio of 50 to 1 or better can be achieved.
\n \u00a0Also with a combination of high transmission interference filter, system can expose a selected UV wavelength.<\/p>\n<\/td>\n

\u00a0Yamashita Denso Corporation<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n","protected":false},"excerpt":{"rendered":"Appearance Products Name Maker UV spot curing system \uff1aHYPERCURE-200 HC-200 is an ideal UV spot curing system t …","protected":false},"author":5,"featured_media":1203,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"acf":[],"aioseo_notices":[],"_links":{"self":[{"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/pages\/6558"}],"collection":[{"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/users\/5"}],"replies":[{"embeddable":true,"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/comments?post=6558"}],"version-history":[{"count":6,"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/pages\/6558\/revisions"}],"predecessor-version":[{"id":6861,"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/pages\/6558\/revisions\/6861"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/media\/1203"}],"wp:attachment":[{"href":"https:\/\/www.jpu.or.jp\/eng\/wp-json\/wp\/v2\/media?parent=6558"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}